SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD OF THE SAME, AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To uniformly clean an extending part of a cup body of a liquid receptacle cup.SOLUTION: Any one of a first cup body (51) and a second cup body (52) is elevated, and both of them is closed. Then, a first gap (G1) formed between a gap formation part (5106) formed on a lower surface of a first extending part (5102) and an upper surface of a second extending part (5202) is smaller than a second gap (G2) between a part where there is not the gap formation part of a first extending part and the upper surface of a second extending part. In such a situation, a cleaning liquid is supplied to the second gap. Since the motion of the cleaning liquid that tend to flow toward an outer direction of a radial direction is limited by the narrow first gap, an entire region of a space between the first extending part and the second extending part can be filled with the cleaning liquid, and a cleaning target surface can be uniformly cleaned.SELECTED DRAWING: Figure 3 【課題】液受けカップのカップ体の張出部をムラ無く洗浄する。【解決手段】第１カップ体（５１）と第２カップ体（５２）のいずれか一方を昇降させて両者を近接状態とする。このとき、第１張出部（５１０２）の下面に形成された隙間形成部（５１０６）と第２張出部（５２０２）の上面との間の第１隙間（Ｇ１）が、第１張出部の隙間形成部が無い部分と第２張出部の上面との間の第２隙間（Ｇ２）よりも小さい。この状態で、第２隙間に洗浄液を供給する。半径方向外向きに流れようとする洗浄液の動きが狭い第１隙間により制限されるので、第１張出部と第２張出部との間の空間の全域を洗浄液で満たすことができ、洗浄対象面をムラ無く洗浄することができる。【選択図】図３