GAS BARRIER FILM

PROBLEM TO BE SOLVED: To provide a gas barrier film without deteriorating gas barrier property even to high temperature environment and flexure, good in adhesiveness to an undercoat and having high transparent and high level gas barrier property.SOLUTION: There is provided a gas barrier film having a gas barrier layer 2 containing a zinc compound and a silicon compound on at least a single side of a polymer film substrate 1, and all points, when values of percentage content of zinc (Zn) atom and silicon (Si) atom (Zn/Si) by an X ray photoelectron spectroscopy (XPS) with 15 nm interval in a depth direction in the gas barrier layer 2 are a0, a1, a2, a3 ... an, where a0 is a value at a measurement point in most surface side of the gas barrier layer 2 and an is a value at a measurement point in a side most near a boundary surface of the gas barrier layer 2 with the polymer film substrate 1, satisfy the following formula.0.8≥ai-a(i+1)>0, where i is an integer of 0 to n-1.SELECTED DRAWING: Figure 1 【課題】高温環境や屈曲に対してもガスバリア性が悪化せず、下地との密着性が良い、高透明かつ高度なガスバリア性を有するガスバリア性フィルムの提供。【解決手段】高分子フィルム基材１の少なくとも片側に、亜鉛化合物とケイ素化合物とを含有するガスバリア層２を有するガスバリア性フィルムであって、ガスバリア層２において、Ｘ線光電子分光法（ＸＰＳ）により亜鉛（Ｚｎ）原子及びケイ素（Ｓｉ）原子の含有比率（Ｚｎ／Ｓｉ）を深さ方向に１５ｎｍ間隔で求めた値を、ａ０，ａ１，ａ２，ａ３・・・ａｎ（ａ０はガスバリア層２の最表面側の測定点での値、ａｎはガスバリア層２の最も高分子フィルム基材１との界面に近い側の測定点での値）としたとき、すべての点が、下記式を満たすガスバリア性フィルム。０．８≧ａｉ−ａ（ｉ＋１）＞０（ｉは０〜ｎ−１の整数）【選択図】図１