APPARATUS FOR MANUFACTURING GLASS SUBSTRATE
PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a glass substrate, capable of manufacturing the glass substrate having a fine uneven pattern applied on the surface.SOLUTION: An apparatus 1 for manufacturing a glass substrate, capable of heating a glass substrate W to press-mold a fin...
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| creator | SHOGETSU ISAO |
| description | PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a glass substrate, capable of manufacturing the glass substrate having a fine uneven pattern applied on the surface.SOLUTION: An apparatus 1 for manufacturing a glass substrate, capable of heating a glass substrate W to press-mold a fine unevenness shape on the glass substrate W comprises: a loading stage 5 placing the glass substrate W and electrically grounded; a molding roll 3 having a fine unevenness shape opposite to that transferred on the glass substrate W and for molding a glass substrate having a fine unevenness shape by rotatably moving while pressing the glass substrate W placed on the loading stage 5; a support 9 for supporting both ends of the molding roll 3 with an insulator; a contact electrode 3A for applying a voltage to the molding roll 3; and voltage applying means 21A for applying a voltage between the loading stage 5 and the molding roll 3.SELECTED DRAWING: Figure 1
【課題】表面に微細な凹凸パターンが施されたガラス基板を製造するガラス基板生成装置を提供する。【解決手段】ガラス基板Ｗを加熱して、ガラス基板Ｗに微細な凹凸形状を押圧成形するガラス基板生成装置１である。そして、ガラス基板Ｗが載置され、電気的に接地される積載ステージ５と、ガラス基板Ｗに転写される微細な凹凸形状と反対の微細な凹凸形状が設けられており、積載ステージ５に載置されているガラス基板Ｗに押し付けられながら回転移動することにより、微細な凹凸形状付ガラス基板を成形する成形ロール３と、成形ロール３の両端を絶縁体で支持する支持体９と、成形ロール３に電圧を印加する接触電極３Ａと、積載ステージ５と成形ロール３との間に電圧を印加する電圧印加手段２１Ａとを有する。【選択図】図１ |
| format | Patent |
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【課題】表面に微細な凹凸パターンが施されたガラス基板を製造するガラス基板生成装置を提供する。【解決手段】ガラス基板Ｗを加熱して、ガラス基板Ｗに微細な凹凸形状を押圧成形するガラス基板生成装置１である。そして、ガラス基板Ｗが載置され、電気的に接地される積載ステージ５と、ガラス基板Ｗに転写される微細な凹凸形状と反対の微細な凹凸形状が設けられており、積載ステージ５に載置されているガラス基板Ｗに押し付けられながら回転移動することにより、微細な凹凸形状付ガラス基板を成形する成形ロール３と、成形ロール３の両端を絶縁体で支持する支持体９と、成形ロール３に電圧を印加する接触電極３Ａと、積載ステージ５と成形ロール３との間に電圧を印加する電圧印加手段２１Ａとを有する。【選択図】図１</description><language>eng ; jpn</language><subject>CHEMISTRY ; GLASS ; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES ; METALLURGY ; MINERAL OR SLAG WOOL</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171102&DB=EPODOC&CC=JP&NR=2017197403A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20171102&DB=EPODOC&CC=JP&NR=2017197403A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHOGETSU ISAO</creatorcontrib><title>APPARATUS FOR MANUFACTURING GLASS SUBSTRATE</title><description>PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a glass substrate, capable of manufacturing the glass substrate having a fine uneven pattern applied on the surface.SOLUTION: An apparatus 1 for manufacturing a glass substrate, capable of heating a glass substrate W to press-mold a fine unevenness shape on the glass substrate W comprises: a loading stage 5 placing the glass substrate W and electrically grounded; a molding roll 3 having a fine unevenness shape opposite to that transferred on the glass substrate W and for molding a glass substrate having a fine unevenness shape by rotatably moving while pressing the glass substrate W placed on the loading stage 5; a support 9 for supporting both ends of the molding roll 3 with an insulator; a contact electrode 3A for applying a voltage to the molding roll 3; and voltage applying means 21A for applying a voltage between the loading stage 5 and the molding roll 3.SELECTED DRAWING: Figure 1
【課題】表面に微細な凹凸パターンが施されたガラス基板を製造するガラス基板生成装置を提供する。【解決手段】ガラス基板Ｗを加熱して、ガラス基板Ｗに微細な凹凸形状を押圧成形するガラス基板生成装置１である。そして、ガラス基板Ｗが載置され、電気的に接地される積載ステージ５と、ガラス基板Ｗに転写される微細な凹凸形状と反対の微細な凹凸形状が設けられており、積載ステージ５に載置されているガラス基板Ｗに押し付けられながら回転移動することにより、微細な凹凸形状付ガラス基板を成形する成形ロール３と、成形ロール３の両端を絶縁体で支持する支持体９と、成形ロール３に電圧を印加する接触電極３Ａと、積載ステージ５と成形ロール３との間に電圧を印加する電圧印加手段２１Ａとを有する。【選択図】図１</description><subject>CHEMISTRY</subject><subject>GLASS</subject><subject>MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB2DAhwDHIMCQ1WcPMPUvB19At1c3QOCQ3y9HNXcPdxDA5WCA51Cg4BKnHlYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBobmhpbmJgbGjsZEKQIA3o4lrQ</recordid><startdate>20171102</startdate><enddate>20171102</enddate><creator>SHOGETSU ISAO</creator><scope>EVB</scope></search><sort><creationdate>20171102</creationdate><title>APPARATUS FOR MANUFACTURING GLASS SUBSTRATE</title><author>SHOGETSU ISAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2017197403A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2017</creationdate><topic>CHEMISTRY</topic><topic>GLASS</topic><topic>MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><toplevel>online_resources</toplevel><creatorcontrib>SHOGETSU ISAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHOGETSU ISAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS FOR MANUFACTURING GLASS SUBSTRATE</title><date>2017-11-02</date><risdate>2017</risdate><abstract>PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a glass substrate, capable of manufacturing the glass substrate having a fine uneven pattern applied on the surface.SOLUTION: An apparatus 1 for manufacturing a glass substrate, capable of heating a glass substrate W to press-mold a fine unevenness shape on the glass substrate W comprises: a loading stage 5 placing the glass substrate W and electrically grounded; a molding roll 3 having a fine unevenness shape opposite to that transferred on the glass substrate W and for molding a glass substrate having a fine unevenness shape by rotatably moving while pressing the glass substrate W placed on the loading stage 5; a support 9 for supporting both ends of the molding roll 3 with an insulator; a contact electrode 3A for applying a voltage to the molding roll 3; and voltage applying means 21A for applying a voltage between the loading stage 5 and the molding roll 3.SELECTED DRAWING: Figure 1
【課題】表面に微細な凹凸パターンが施されたガラス基板を製造するガラス基板生成装置を提供する。【解決手段】ガラス基板Ｗを加熱して、ガラス基板Ｗに微細な凹凸形状を押圧成形するガラス基板生成装置１である。そして、ガラス基板Ｗが載置され、電気的に接地される積載ステージ５と、ガラス基板Ｗに転写される微細な凹凸形状と反対の微細な凹凸形状が設けられており、積載ステージ５に載置されているガラス基板Ｗに押し付けられながら回転移動することにより、微細な凹凸形状付ガラス基板を成形する成形ロール３と、成形ロール３の両端を絶縁体で支持する支持体９と、成形ロール３に電圧を印加する接触電極３Ａと、積載ステージ５と成形ロール３との間に電圧を印加する電圧印加手段２１Ａとを有する。【選択図】図１</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMISTRY GLASS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL |
| title | APPARATUS FOR MANUFACTURING GLASS SUBSTRATE |
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