NONVOLATILE SEMICONDUCTOR MEMORY DEVICE

PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device capable of stabilizing capacitance characteristics while improving withstand voltage characteristics of a capacitive element, and enabling miniaturizing.SOLUTION: In a nonvolatile semiconductor memory device 1, by forming a c...

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Bibliographische Detailangaben
Hauptverfasser: KAWASHIMA YASUHIKO, NODA TOSHIFUMI, TANIGUCHI YASUHIRO, OWADA FUKUO, KASAI HIDEO, KATO TAKAFUMI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device capable of stabilizing capacitance characteristics while improving withstand voltage characteristics of a capacitive element, and enabling miniaturizing.SOLUTION: In a nonvolatile semiconductor memory device 1, by forming a capacitance side wall insulating film 21 of each of capacitive elements C1 and C2 in the same layer as the side wall spacers 13a, 13b of the memory cell 2 whose film quality and thickness are adjusted by paying attention to withstand voltage, capacitance characteristics can be stabilized while improving the withstand voltage characteristics of the capacitive elements C1 and C2. In addition, in this nonvolatile semiconductor memory device 1, since a power supply for suppressing the voltage applied to the capacitive element to a low voltage unlike in the prior art becomes unnecessary, a configuration can be simplified and miniaturization can be achieved.SELECTED DRAWING: Figure 1 【課題】容量素子の耐圧特性を向上しつつ、容量特性を安定化させることができ、また小型化を図り得る不揮発性半導体記憶装置を提案する。【解決手段】本発明による不揮発性半導体記憶装置1では、容量素子C1,C2の容量側壁絶縁膜21を、耐圧に着目して膜質や膜厚が調整された、メモリセル2の側壁スペーサ13a,13bと同一層としたことで、容量素子C1,C2の耐圧特性を向上させつつ、容量特性を安定化させることができる。また、この不揮発性半導体記憶装置1では、従来のような、容量素子に印加される電圧を低電圧に抑えるための電源も不要となるので、その分、構成も簡素化し得、小型化を図り得る。【選択図】図1