METAL ION FEEDING DEVICE

PROBLEM TO BE SOLVED: To provide a metal ion feeding device in which the device configuration is not complex, the degradation of a dissolution rate of metal particles is suppressed, and generation of sludge is prevented.SOLUTION: A metal ion feeding device 100 dissolves metal particles P by distribu...

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Bibliographische Detailangaben
Hauptverfasser:	KAMIO KEIJI, ARAKAWA TAKUYA, YAMAMOTO AKIRA
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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