AUXILIARY EXPOSURE DEVICE

PROBLEM TO BE SOLVED: To provide an auxiliary exposure device capable of increasing exposure resolution.SOLUTION: The auxiliary exposure device is disposed on a pre-stage side or a post-stage side of an exposure device that executes exposure processing on a processing-target substrate and executes e...

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Bibliographische Detailangaben
Hauptverfasser: OTA YOSHIHARU, SATAKE JUN
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an auxiliary exposure device capable of increasing exposure resolution.SOLUTION: The auxiliary exposure device is disposed on a pre-stage side or a post-stage side of an exposure device that executes exposure processing on a processing-target substrate and executes exposure processing locally on the processing-target substrate. The auxiliary exposure device includes a conveyance part and a light source unit. The conveyance part conveys the processing-target substrate in a scanning direction. The light source unit irradiates the processing-target substrate conveyed in the scanning direction with light, which is in a line form with its longitudinal direction crossing with the scanning direction. Further, the light source unit includes a digital micromirror device in which a plurality of movable micromirrors are arranged.SELECTED DRAWING: Figure 4 【課題】露光分解能を高めることができる補助露光装置を提供すること。【解決手段】実施形態に係る補助露光装置は、被処理基板に対して露光処理を行う露光装置の前段側または後段側に配置され、被処理基板に対して局所的に露光処理を行う補助露光装置であって、搬送部と、光源ユニットとを備える。搬送部は、被処理基板を走査方向に搬送する。光源ユニットは、走査方向に搬送される被処理基板に対し、走査方向と交差する方向を長手方向とするライン状の光を照射する。また、光源ユニットは、複数の可動式マイクロミラーを配列したデジタルマイクロミラーデバイスを含んで構成される。【選択図】図4