PHOTOCURABLE COMPOSITION FOR STEREOLITHOGRAPHY
PROBLEM TO BE SOLVED: To provide a photocurable composition for stereolithography, which comprises a urethane (meth)acrylate and a reactive dilution component and gives a soft molded object having high flexibility and a high elongation rate.SOLUTION: The photocurable composition for stereolithograph...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a photocurable composition for stereolithography, which comprises a urethane (meth)acrylate and a reactive dilution component and gives a soft molded object having high flexibility and a high elongation rate.SOLUTION: The photocurable composition for stereolithography comprises a urethane (meth)acrylate polymerizable monomer (A), a polymerizable monomer (B) represented by formula (I) below, and a photopolymerization initiator (C), in which the content percentage of the polymerizable monomer (B) represented by formula (I) is 20 to 70 mass% in the whole polymerizable monomers. In the formula, Rrepresents a hydrogen atom or a methyl group; and Rrepresents an alkylene group having 2 to 5 carbon atoms in which at least one hydrogen atom is replaced by a hydroxyl group.SELECTED DRAWING: None
【課題】ウレタン(メタ)アクリレートおよび反応性希釈成分を含有する光学的立体造形用光硬化性組成物であって、柔軟性が高く伸び率が大きい軟質の造形物を与える、光学的立体造形用光硬化性組成物を提供する。【解決手段】ウレタン(メタ)アクリレート系重合性モノマー(A)、下記式(I)で表される重合性モノマー(B)、および光重合開始剤(C)を含有し、全重合性モノマー中の前記下記式(I)で表される重合性モノマー(B)の含有率が、20〜70質量%である、光学的立体造形用光硬化性組成物とする。(式中、R1は、水素原子、またはメチル基を示し、R2は、少なくとも1個の水素原子がヒドロキシル基で置換された炭素数2〜5のアルキレン基を示す。)【化1】【選択図】なし |
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