OPTICAL SYSTEM FOR ANNEALING POLY-SILICON THIN FILM BY LASER

PROBLEM TO BE SOLVED: To provide a gas discharge laser crystallization apparatus for performing transformation of crystal growth or orientation in a film on a workpiece.SOLUTION: A laser system is configured as a POPA laser system and further comprises: a relay optical system operative to direct a f...

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Bibliographische Detailangaben
Hauptverfasser:	PALASH P DAS, WILLIAM N PARTLO, RUSSELL HUDYMA, MICHAEL THOMAS
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CLADDING OR PLATING BY SOLDERING OR WELDING CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACHINE TOOLS MATERIALS THEREFOR METAL-WORKING NOT OTHERWISE PROVIDED FOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SOLDERING OR UNSOLDERING TRANSPORTING WELDING WORKING BY LASER BEAM
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a gas discharge laser crystallization apparatus for performing transformation of crystal growth or orientation in a film on a workpiece.SOLUTION: A laser system is configured as a POPA laser system and further comprises: a relay optical system operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and a timing and control module adjusting timing of occurrence of gas discharge in the first and second laser units within plus or minus 3 nsec, to produce the second laser output light pulse beam as amplification of the first laser output light pulse beam. The system comprises a divergence control part in an oscillator laser unit. The divergence control part comprises an unstable oscillation control part. The system further comprises a beam pointing control mechanism and a beam position control mechanism, between the laser and the workpiece.SELECTED DRAWING: Figure 6 【課題】被加工物の薄膜における配向又は結晶成長の変換を実行するためのガス放電レーザ結晶化装置を提供する。【解決手段】レーザシステムはＰＯＰＡレーザシステムとして構成され、第１レーザＰＯユニットから第２レーザＰＡユニットに第１出力レーザ光パルスビームを方向付けるように動作されるリレー光学系と、第１レーザ出力光パルスビームの拡大として第２レーザ出力光パルスビームを発生するように、パルス又は−３ｎｓｅｃ内で第１及び第２レーザユニットにおいてガス放電の発生のタイミングを合わせるタイミング及び制御モジュールとを更に有する。発信器レーザユニットにおいて発散制御部を有する。発散制御部は不安定発振制御部を有する。レーザと被加工物との中間にビームポインティング制御機構及びビーム位置制御機構を更に有する。【選択図】図６