MICROLITHOGRAPHY PROJECTION OBJECTIVE LENS

PROBLEM TO BE SOLVED: To provide a microlithography projection objective lens for imaging into an image plane a pattern arranged in an object plane, capable of suppressing stray light.SOLUTION: Provided is a microlithography projection objective lens 10 for imaging into an image plane a pattern arranged in an objective plane, comprising a first objective lens part 16, a second objective lens part 18, and at least one third objective lens part 20, the second objective lens part 18 defining a light propagation direction that differs from a light propagation direction in the first objective lens part 16 and from a light propagation direction in the third objective lens part 20. The microlithography projection objective lens 10 also includes at least one beam deflecting device 22 disposed between the first objective lens part 16 and second objective lens part 18 and between the second objective lens part 18 and third objective lens part 20, and at least one shield 24 arranged in a region of the beam deflecting device 22 in such a way that direct light leakage from the first objective lens part 16 to the third objective lens part 20 is at least reduced.SELECTED DRAWING: Figure 1 【課題】物体平面に配置されるパターンを像平面内に結像するマイクロリソグラフィ投影対物レンズにおいて迷光を抑制する。【解決手段】物体平面に配置されるパターンを像平面内に結像するマイクロリソグラフィ投影対物レンズ１０が提供され、第１対物レンズ部１６と、第２対物レンズ部１８と、少なくとも一つの第３対物レンズ部２０とを備え、第２対物レンズ部１８は、第１対物レンズ部１０における光伝搬方向および第３対物レンズ部２０における光伝搬方向と異なる光伝搬方向を規定し、かつ第１対物レンズ部１０と第２対物レンズ部１８との間および第２対物レンズ部１８と第３対物レンズ部２０との間に少なくとも一つのビーム偏向装置２２をさらに備え、少なくとも一つのシールド２４が、第１対物レンズ部１６から第３対物レンズ部内２０への直接光漏れが少なくとも減少するようにしてビーム偏向装置２２の領域に配置される。【選択図】図１