SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method, capable of removing foreign matters attached to an upper surface of a peripheral wall portion of a cup.SOLUTION: A substrate processing apparatus according to one aspect of an embodiment includes a holding unit, a processing liquid supply unit, a cup, and a cleaning liquid supply unit. The holding unit holds a substrate. The processing liquid supply unit supplies a processing liquid to the substrate. The cup includes a bottom portion, a tubular peripheral wall portion erected on the bottom portion, a liquid receiving portion provided above the peripheral wall portion and configured to receive the processing liquid scattered from the substrate, and a groove portion formed on an upper surface of the peripheral wall portion along a circumferential direction, the cup surrounding the holding unit. The cleaning liquid supply unit supplies a cleaning liquid to the upper surface of the peripheral wall portion.SELECTED DRAWING: Figure 5 【課題】カップの周壁部の上面に付着した異物を除去することのできる基板処理装置および基板処理方法を提供する。【解決手段】実施形態の一態様に係る基板処理装置は、保持部と、処理液供給部と、カップと、洗浄液供給部とを備える。保持部は、基板を保持する。処理液供給部は、基板に対して処理液を供給する。カップは、底部と、底部から立設される筒状の周壁部と、周壁部の上方に設けられ基板から飛散した処理液を受ける液受部と、周壁部の上面に周方向に沿って形成された溝部とを有し、保持部を取り囲む。洗浄液供給部は、周壁部の上面に対して洗浄液を供給する。【選択図】図５