SURFACE SCANNING INSPECTION SYSTEM WITH INDEPENDENTLY ADJUSTABLE SCAN PITCH

PROBLEM TO BE SOLVED: To provide a scanning wafer inspection system with an independently adjustable scan pitch.SOLUTION: A scan pitch of a wafer inspection system 100 is adjusted independently from an illumination area. The scan pitch is adjusted to achieve desired defect detection sensitivity over...

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Bibliographische Detailangaben

Hauptverfasser:	CHRISTIAN WOLTERS, JUERGEN REICH
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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