NOZZLE STANDBY DEVICE AND SUBSTRATE PROCESSING DEVICE

PROBLEM TO BE SOLVED: To provide a nozzle standby device capable of reducing the unwashed nozzles, when cleaning nozzles discharging process liquid to a substrate, and to provide a substrate processing device.SOLUTION: At a standby pot 31, a development nozzle housing section 33 has an opening 33a i...

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Bibliographische Detailangaben
Hauptverfasser:	KIRITA MASASHI, KADOMA TORU, KASHIWAYAMA MASATO, NISHIYAMA KOJI, KABUNE KOTA, TAKAHASHI YASUO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a nozzle standby device capable of reducing the unwashed nozzles, when cleaning nozzles discharging process liquid to a substrate, and to provide a substrate processing device.SOLUTION: At a standby pot 31, a development nozzle housing section 33 has an opening 33a in the upper surface, and houses a development nozzle 3 through the opening 33a. A nozzle cleaning liquid supply section 37 has a nozzle cleaning liquid discharge port 39 provided in the side face in the development nozzle housing section 33, and supplies nozzle cleaning liquid from the nozzle cleaning liquid discharge port 39. The nozzle cleaning liquid discharge port 39 is constituted of a ring-shaped slit directing inward. Consequently, it can supply the nozzle cleaning liquid uniformly to the whole circumference of development nozzle 3. Unwashed development nozzles 3 can thereby be reduced.SELECTED DRAWING: Figure 4 【課題】基板に処理液を吐出するノズルを洗浄する際に、ノズルの洗い残しを低減できるノズル待機装置および基板処理装置を提供する。【解決手段】待機ポット３１において、現像ノズル収容部３３は、上面に開口部３３ａを有し、開口部３３ａを通じて現像ノズル３を収容する。ノズル洗浄液供給部３７は、現像ノズル収容部３３内の側面に設けられたノズル洗浄液吐出口３９を有し、ノズル洗浄液吐出口３９からノズル洗浄液を供給させる。ここで、そのノズル洗浄液吐出口３９は、内側を向いたリング状のスリットで構成されている。これにより、現像ノズル３の全周にノズル洗浄液を均一に供給することができる。そのため、現像ノズル３の洗い残しを低減できる。【選択図】図４