DIELECTRIC STACK, ISOLATOR DEVICE, AND METHOD OF FORMING ISOLATOR DEVICE
PROBLEM TO BE SOLVED: To enhance ability to withstand an electric field generated at an edge of a conductor by making a body of a first dielectric tapered to provide stress relief to be able to prevent a second dielectric material from developing stress cracks.SOLUTION: An isolator device is provide...
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Format: | Patent |
Sprache: | eng ; jpn |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To enhance ability to withstand an electric field generated at an edge of a conductor by making a body of a first dielectric tapered to provide stress relief to be able to prevent a second dielectric material from developing stress cracks.SOLUTION: An isolator device is provided which comprises a body of first dielectric material between first and second conductors such as primary and secondary coils of a micro-transformer. A region of the second dielectric material is provided between the body of the first dielectric material and at least one of first and second electrodes, and the second dielectric material has a higher relative permittivity than the first dielectric material.SELECTED DRAWING: Figure 1
【課題】導電体の縁部に発生する電場に耐える能力を向上させる。第1の誘電体の本体は、応力除去を提供するためにテーパ状であり、第2の誘電体材料が応力亀裂を発生するのを防止することができる。【解決手段】第1および第2の導電体、例えばマイクロトランスの1次コイルと2次コイルとの間に第1の誘電体材料の本体を備える、アイソレータ装置が提供される。第2の誘電体材料の領域は、第1の誘電体材料の本体と第1および第2の電極のうちの少なくとも1つとの間に提供され、第2の誘電体材料が、第1の誘電体材料より高い比誘電率を有する。【選択図】図1 |
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