POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS

PROBLEM TO BE SOLVED: To provide a polymer having improved solubility while ensuring etch resistance, an organic layer composition comprising the polymer, and a method of forming patterns using the organic layer composition.SOLUTION: A polymer includes a structural unit represented by the chemical f...

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Bibliographische Detailangaben
Hauptverfasser:	PARK YOUJUNG, YANG SUNYOUNG, KWON HYO-YOUNG
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a polymer having improved solubility while ensuring etch resistance, an organic layer composition comprising the polymer, and a method of forming patterns using the organic layer composition.SOLUTION: A polymer includes a structural unit represented by the chemical formula 1 in the figure. (The definition of the chemical formula 1 is the same as the definition in the specification.)SELECTED DRAWING: None 【課題】本発明は、耐エッチング性を確保しながらも、溶解度が向上した重合体、前記重合体を含む有機膜組成物、そして前記有機膜組成物を用いたパターン形成方法を提供する。【解決手段】本発明の一実施形態に係る重合体は、下記の化学式１で表される構造単位を含む。（前記化学式１の定義は、明細書中の定義と同意義である。）【選択図】なし