SEMICONDUCTOR WAFER INSPECTION DEVICE AND SEMICONDUCTOR WAFER INSPECTION METHOD

PROBLEM TO BE SOLVED: To provide a semiconductor wafer inspection device which inhibits warp of a semiconductor wafer from being caused by a temperature difference between a placement surface of a table and the semiconductor wafer, and to provide a semiconductor wafer inspection method.SOLUTION: A s...

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Bibliographische Detailangaben
Hauptverfasser: MOTOYAMA TAKASHI, YAMAGUCHI AKIRA, TAKAHASHI TAKETAKA, ISHIMOTO TAKASHI, SHIGESAWA YUJI
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a semiconductor wafer inspection device which inhibits warp of a semiconductor wafer from being caused by a temperature difference between a placement surface of a table and the semiconductor wafer, and to provide a semiconductor wafer inspection method.SOLUTION: A semiconductor wafer inspection device includes: a table 20 having a placement surface 18 on which a semiconductor wafer W is placed; a heater 24 for heating the placement surface 18; and stage pins 28 which hold the semiconductor wafer W at a separation position where the semiconductor wafer W is separated from the placement surface 18. The semiconductor wafer W is preheated while being held at the separation position by the stage pins 28.SELECTED DRAWING: Figure 2 【課題】テーブルの載置面と半導体ウェーハとの温度差に起因する半導体ウェーハの反りを抑制することができる半導体ウェーハの検査装置及び半導体ウェーハの検査方法を提供する。【解決手段】半導体ウェーハWが載置される載置面18を有するテーブル20と、載置面18を加熱するヒータ24と、半導体ウェーハWが載置面18から離間した離間位置に半導体ウェーハWを保持するステージピン28と、を備える。ステージピン28によって、半導体ウェーハWを離間位置に保持した状態で予備加熱する。【選択図】図2