IRRADIATION APPARATUS

PROBLEM TO BE SOLVED: To provide an irradiation apparatus that is simple in configuration and can prevent the breakage of a mask.SOLUTION: The irradiation apparatus comprises a mask holder 5 for holding a mask 50 for light-blocking a prescribed area of a workpiece against gravity between an irradiat...

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Bibliographische Detailangaben
1. Verfasser:	MURAMOTO KOSUKE
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an irradiation apparatus that is simple in configuration and can prevent the breakage of a mask.SOLUTION: The irradiation apparatus comprises a mask holder 5 for holding a mask 50 for light-blocking a prescribed area of a workpiece against gravity between an irradiation device and the workpiece, and has a receiving part 60 for receiving the mask 50 which has fallen off from the mask holder 5 by alleviating the impact shock with the mask 50.SELECTED DRAWING: Figure 3 【課題】簡易な構成で、マスクの破損を防止可能な照射装置を提供すること。【解決手段】照射装置は、照射器とワークとの間に、ワークの所定領域を遮光するマスク５０を重力に抗して保持するマスクホルダ５を備え、マスクホルダ５から脱落したマスク５０を、マスク５０との衝撃を緩和して受け止める受け止め部６０を有している。【選択図】図３