EXPOSURE DEVICE, EXPOSURE METHOD, AND MANUFACTURING METHOD OF ARTICLE

PROBLEM TO BE SOLVED: To provide a scanning type exposure device that is advantageous for performing stitching exposure.SOLUTION: The exposure device includes: a blade 18 that forms an aperture for shaping light from a light source; a shield plate 18a which is provided to be movable along a scanning direction and defines width of the scanning direction of the light passed through the aperture; and a control part 12 that controls scanning exposure executed in order on a first shot region, a second shot region including a first overlapping connection region, and a third shot region including a second connection region overlapping with the second shot region provided on a substrate 10. The control part controls movement of the shield plate such that the moving directions of the shield plate vary between the scanning exposure of the first connection region and the scanning exposure of the second connection region in order to control the exposure amount of the second shot region while moving the shield plate.SELECTED DRAWING: Figure 1 【課題】走査型の露光装置で、つなぎ露光を行うのに有利な露光装置を提供する。【解決手段】光源からの光を整形するための開口を形成するブレード１８と、走査方向に沿って移動可能に設けられ、開口を通過した光の走査方向の幅を規定する遮蔽板１８ａと、基板１０上に第１ショット領域、重なり合う第１つなぎ領域を含む第２ショット領域、及び、第２ショット領域に重なり合う第２つなぎ領域を含む第３ショット領域の順に行われる走査露光を制御する制御部１２と、を有し、制御部は、遮蔽板を移動させながら、第２ショット領域の露光量を制御するために、第１つなぎ領域の走査露光時と第２つなぎ領域の走査露光時とで遮蔽板の移動方向が異なるように、遮蔽板の移動を制御する。【選択図】図１