VAPOR DEPOSITION DEVICE

PROBLEM TO BE SOLVED: To provide a vapor deposition device that is facilitated in maintenance work for an evaporation source.SOLUTION: The vapor deposition device includes an evaporation source installation part 40 provided with the evaporation source 2 for storing a vapor deposition material to per...

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Bibliographische Detailangaben
Hauptverfasser: GOTO RYOTA, MISAWA KEITA, KAZAMA YOSHIAKI, SHIMEKI KOUICHI
Format: Patent
Sprache:eng ; jpn
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a vapor deposition device that is facilitated in maintenance work for an evaporation source.SOLUTION: The vapor deposition device includes an evaporation source installation part 40 provided with the evaporation source 2 for storing a vapor deposition material to perform vapor deposition. The vapor deposition device includes: a shielding part 5 surrounding the evaporation source installation part 40; and a restriction plate 4 provided in an upper position of the shielding part 5 to restrict an incidence angle of an evaporation particle of a deposition material discharged toward a substrate 1 from the evaporation source 2 provided to the evaporation source installation part 40 to the substrate 1, where the restriction plate 4 is movable relative to the shielding part 5 and the shielding part 5 is provided with an opening/closing part 6.SELECTED DRAWING: Figure 2 【課題】蒸発源のメンテナンス作業が行いやすい蒸着装置の提供。【解決手段】蒸着材料を収容する蒸発源2を蒸発源設置部40に設置して蒸着を行う蒸着装置であって、蒸発源設置部40を囲む遮蔽部5を設け、蒸発源設置部40に設置される蒸発源2から基板1に向かって放出される成膜材料の蒸発粒子の基板1への入射角を制限する制限板4を遮蔽部5の上方位置に設け、制限板4は、遮蔽部5に対して可動自在に設けた構成とし、遮蔽部5には、開閉部6を設けた蒸着装置。【選択図】図2