VACUUM EVAPORATION DEVICE, PRODUCTION METHOD OF EVAPORATION FILM AND PRODUCTION METHOD OF ORGANIC ELECTRONIC DEVICE

PROBLEM TO BE SOLVED: To provide a vacuum evaporation device which enables deposition of a desired pattern in high accuracy by avoiding thermal deformation during evaporation.SOLUTION: The vacuum evaporation device includes, in an evaporation chamber 1: an evaporation source 2 for evaporating a substrate through a mask; and an evaporation source moving mechanism for relatively moving the evaporation source 2 to the substrate when evaporating, or a substrate moving mechanism for relatively moving the substrate to the evaporation source when evaporating. The evaporation source moving mechanism or the substrate moving mechanism are composed so that preheating of the mask is performed by using the evaporation source 2, before starting evaporation to the substrate.SELECTED DRAWING: Figure 1 【課題】蒸着中の熱変形を防止して高精度に所望のパターンで成膜可能な真空蒸着装置の提供。【解決手段】蒸着室１に、マスクを介して基板に蒸着を行う蒸発源２と、蒸着を行う際に前記蒸発源２を前記基板に対して相対的に移動させる蒸発源移動機構または蒸着を行う際に前記基板を前記蒸発源に対して相対的に移動させる基板移動機構とを設けた真空蒸着装置であって、前記基板への蒸着を開始する前に、前記蒸発源２を用いて前記マスクの事前加熱を行うように前記蒸発源移動機構または前記基板移動機構を構成する。【選択図】図１