RESIN COMPOSITION, PRODUCTION METHOD OF RESIN COMPOSITION, RESIST COMPOSITION COMPRISING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING RESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a resin composition having a narrow molecular weight distribution, which can be suitably used for a resist material containing a carboxyl group by an easy method, a production method of the resin composition, a resist composition comprising the above resin compositio...

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Bibliographische Detailangaben
Hauptverfasser:	NUNOE JUN, MURAKI TAKAHITO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a resin composition having a narrow molecular weight distribution, which can be suitably used for a resist material containing a carboxyl group by an easy method, a production method of the resin composition, a resist composition comprising the above resin composition, and a pattern forming method using the resist composition.SOLUTION: The resin composition comprises a borane-based radical polymerization initiator (A), a vinyl monomer (B) containing a carboxyl group, and a vinyl monomer (C) containing no carboxyl group.SELECTED DRAWING: Figure 1 【課題】本発明の課題は、簡便な方法にて、カルボキシル基を含むレジスト材に好適な分子量分布が狭い樹脂組成物、当該樹脂組成物の製造方法、当該樹脂組成物を含むレジスト組成物及び当該レジスト組成物を用いたパターン形成方法を提供することである。【解決手段】当該課題は、ボラン系ラジカル重合開始剤（Ａ）と、カルボキシル基を含むビニルモノマー（Ｂ）と、カルボキシル基を含まないビニルモノマー（Ｃ）と、を含む、樹脂組成物により解決される。【選択図】図１