POLISHING LIQUID, STORAGE LIQUID AND POLISHING METHOD

PROBLEM TO BE SOLVED: To provide a polishing liquid that makes it possible to polish sapphire at a high polishing rate.SOLUTION: A polishing liquid for polishing a substrate comprising sapphire comprises: at least one large silica with an average primary particle diameter of 60-150 nm; at least one...

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Bibliographische Detailangaben
Hauptverfasser:	GO YUTAKA, INOUE KEISUKE
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES TRANSPORTING
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