VAPOR DEPOSITION APPARATUS, AND VAPOR DEPOSITION METHOD

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method capable of improving the use efficiency of a vapor deposition material, and excellent in the material homogeneity of a thin film composed of a plurality of kinds of vapor deposition materials.SOLUTION: A vapor deposition apparatus comprises, in a chamber 1: a first vapor deposition stage 11 having a first mask bed 3 for supporting a mask 2 and a substrate 7 at a vapor deposition time, and a first alignment mechanism 9; a second vapor deposition stage 12 having a second mask bed 4 for supporting the mask 2 and a substrate 8 at the vapor deposition time, and a second alignment mechanism 10; a vapor deposition source 6 for performing vapor depositions on the substrates 7 and 8 individually arranged on the mask beds 3 and 4; a first shutter 21 for controlling the injection of a vapor deposition material to the substrate 7 arranged on the mask bed 3 from the vapor deposition source 6; and a second shutter 22 for controlling the injection of the vapor deposition material from the vapor deposition source 6 to the substrate 8 arranged on the mask bed 4, wherein the first vapor deposition stage 11 and the second vapor deposition stage 12 are arranged to neighbor.SELECTED DRAWING: Figure 1 【課題】蒸着材料の使用効率を改善し得ると共に、複数種の蒸着材料から成る薄膜の材料均一性にも優れた蒸着装置並びに蒸着方法の提供。【解決手段】チャンバ１内に、蒸着時にマスク２及び基板７を支持する第１のマスク台３と第１のアライメント機構９とを有する第１の蒸着ステージ11と、蒸着時にマスク２及び基板８を支持する第２のマスク台４と第２のアライメント機構10とを有する第２の蒸着ステージ12と、マスク台３，４に夫々配置された基板７，８に蒸着を行う蒸着源６と、マスク台３に配置された基板７への蒸着源６からの蒸着材料の入射を制御する第１のシャッタ21と、マスク台４に配置された基板８への蒸着源６からの蒸着材料の入射を制御する第２のシャッタ22とを有する蒸着装置であって、第１の蒸着ステージ11と第２の蒸着ステージ12とを隣接して配置した蒸着装置。【選択図】図１