OPTICAL DEVICE HAVING DEFORMABLE OPTICAL ELEMENT
PROBLEM TO BE SOLVED: To provide an optical device capable of actively deforming at least one optical element particularly in a simple manner so as to achieve a rapid correction of an imaging error, and thereby, giving an imaging quality that is continuously as high as possible with a high throughpu...
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| creator | MANFRED STEINBACH ARMIN SCHOEPPACH |
| description | PROBLEM TO BE SOLVED: To provide an optical device capable of actively deforming at least one optical element particularly in a simple manner so as to achieve a rapid correction of an imaging error, and thereby, giving an imaging quality that is continuously as high as possible with a high throughput.SOLUTION: The present invention relates to an optical device 108 for microlithography, including an optical module 109 and a support structure 110 that supports the optical module 109. The optical module 109 includes an optical element 107.1 and a holding device 111 that holds the optical element 107.1. The holding device 111 includes a deformation device 114 having a plurality of active deformation units 114.1. The deformation unit 114.1 is configured to be in contact with the optical element 107.1 and to impart a predetermined deformation to the optical element 107.1. The optical module 109 is fixed to the support structure 110 in a replaceable manner.SELECTED DRAWING: Figure 2
【課題】結像誤差を素早く補正するために１つ以上の光学素子を特に簡単に能動的に変形することを可能とし、これにより、高い処理量で継続的にできるだけ高い結像品質が得られる光学装置を提供する。【解決手段】光学モジュール１０９と、光学モジュール１０９を支持する支持構造部１１０とを備えるマイクロリソグラフィ用の光学装置１０８に関する。光学モジュール１０９は、光学素子１０７．１および光学素子１０７．１を保持する保持装置１１１を備える。保持装置１１１は、複数の能動的な変形ユニット１１４．１を有する変形装置１１４を備え、変形ユニット１１４．１は光学素子１０７．１に接触し、光学素子１０７．１に所定の変形を付与するように構成されている。光学モジュール１０９は交換可能に支持構造部１１０に固定されている。【選択図】図２ |
| format | Patent |
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【課題】結像誤差を素早く補正するために１つ以上の光学素子を特に簡単に能動的に変形することを可能とし、これにより、高い処理量で継続的にできるだけ高い結像品質が得られる光学装置を提供する。【解決手段】光学モジュール１０９と、光学モジュール１０９を支持する支持構造部１１０とを備えるマイクロリソグラフィ用の光学装置１０８に関する。光学モジュール１０９は、光学素子１０７．１および光学素子１０７．１を保持する保持装置１１１を備える。保持装置１１１は、複数の能動的な変形ユニット１１４．１を有する変形装置１１４を備え、変形ユニット１１４．１は光学素子１０７．１に接触し、光学素子１０７．１に所定の変形を付与するように構成されている。光学モジュール１０９は交換可能に支持構造部１１０に固定されている。【選択図】図２</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161110&DB=EPODOC&CC=JP&NR=2016191936A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161110&DB=EPODOC&CC=JP&NR=2016191936A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MANFRED STEINBACH</creatorcontrib><creatorcontrib>ARMIN SCHOEPPACH</creatorcontrib><title>OPTICAL DEVICE HAVING DEFORMABLE OPTICAL ELEMENT</title><description>PROBLEM TO BE SOLVED: To provide an optical device capable of actively deforming at least one optical element particularly in a simple manner so as to achieve a rapid correction of an imaging error, and thereby, giving an imaging quality that is continuously as high as possible with a high throughput.SOLUTION: The present invention relates to an optical device 108 for microlithography, including an optical module 109 and a support structure 110 that supports the optical module 109. The optical module 109 includes an optical element 107.1 and a holding device 111 that holds the optical element 107.1. The holding device 111 includes a deformation device 114 having a plurality of active deformation units 114.1. The deformation unit 114.1 is configured to be in contact with the optical element 107.1 and to impart a predetermined deformation to the optical element 107.1. The optical module 109 is fixed to the support structure 110 in a replaceable manner.SELECTED DRAWING: Figure 2
【課題】結像誤差を素早く補正するために１つ以上の光学素子を特に簡単に能動的に変形することを可能とし、これにより、高い処理量で継続的にできるだけ高い結像品質が得られる光学装置を提供する。【解決手段】光学モジュール１０９と、光学モジュール１０９を支持する支持構造部１１０とを備えるマイクロリソグラフィ用の光学装置１０８に関する。光学モジュール１０９は、光学素子１０７．１および光学素子１０７．１を保持する保持装置１１１を備える。保持装置１１１は、複数の能動的な変形ユニット１１４．１を有する変形装置１１４を備え、変形ユニット１１４．１は光学素子１０７．１に接触し、光学素子１０７．１に所定の変形を付与するように構成されている。光学モジュール１０９は交換可能に支持構造部１１０に固定されている。【選択図】図２</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDwDwjxdHb0UXBxDfN0dlXwcAzz9HMH8tz8g3wdnXxcFWAKXH1cfV39QngYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBoZmhpaGlsZmjMVGKAGTKJpc</recordid><startdate>20161110</startdate><enddate>20161110</enddate><creator>MANFRED STEINBACH</creator><creator>ARMIN SCHOEPPACH</creator><scope>EVB</scope></search><sort><creationdate>20161110</creationdate><title>OPTICAL DEVICE HAVING DEFORMABLE OPTICAL ELEMENT</title><author>MANFRED STEINBACH ; ARMIN SCHOEPPACH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2016191936A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MANFRED STEINBACH</creatorcontrib><creatorcontrib>ARMIN SCHOEPPACH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MANFRED STEINBACH</au><au>ARMIN SCHOEPPACH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>OPTICAL DEVICE HAVING DEFORMABLE OPTICAL ELEMENT</title><date>2016-11-10</date><risdate>2016</risdate><abstract>PROBLEM TO BE SOLVED: To provide an optical device capable of actively deforming at least one optical element particularly in a simple manner so as to achieve a rapid correction of an imaging error, and thereby, giving an imaging quality that is continuously as high as possible with a high throughput.SOLUTION: The present invention relates to an optical device 108 for microlithography, including an optical module 109 and a support structure 110 that supports the optical module 109. The optical module 109 includes an optical element 107.1 and a holding device 111 that holds the optical element 107.1. The holding device 111 includes a deformation device 114 having a plurality of active deformation units 114.1. The deformation unit 114.1 is configured to be in contact with the optical element 107.1 and to impart a predetermined deformation to the optical element 107.1. The optical module 109 is fixed to the support structure 110 in a replaceable manner.SELECTED DRAWING: Figure 2
【課題】結像誤差を素早く補正するために１つ以上の光学素子を特に簡単に能動的に変形することを可能とし、これにより、高い処理量で継続的にできるだけ高い結像品質が得られる光学装置を提供する。【解決手段】光学モジュール１０９と、光学モジュール１０９を支持する支持構造部１１０とを備えるマイクロリソグラフィ用の光学装置１０８に関する。光学モジュール１０９は、光学素子１０７．１および光学素子１０７．１を保持する保持装置１１１を備える。保持装置１１１は、複数の能動的な変形ユニット１１４．１を有する変形装置１１４を備え、変形ユニット１１４．１は光学素子１０７．１に接触し、光学素子１０７．１に所定の変形を付与するように構成されている。光学モジュール１０９は交換可能に支持構造部１１０に固定されている。【選択図】図２</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | OPTICAL DEVICE HAVING DEFORMABLE OPTICAL ELEMENT |
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