OPTICAL DEVICE HAVING DEFORMABLE OPTICAL ELEMENT

PROBLEM TO BE SOLVED: To provide an optical device capable of actively deforming at least one optical element particularly in a simple manner so as to achieve a rapid correction of an imaging error, and thereby, giving an imaging quality that is continuously as high as possible with a high throughpu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MANFRED STEINBACH, ARMIN SCHOEPPACH
Format: Patent
Sprache:eng ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide an optical device capable of actively deforming at least one optical element particularly in a simple manner so as to achieve a rapid correction of an imaging error, and thereby, giving an imaging quality that is continuously as high as possible with a high throughput.SOLUTION: The present invention relates to an optical device 108 for microlithography, including an optical module 109 and a support structure 110 that supports the optical module 109. The optical module 109 includes an optical element 107.1 and a holding device 111 that holds the optical element 107.1. The holding device 111 includes a deformation device 114 having a plurality of active deformation units 114.1. The deformation unit 114.1 is configured to be in contact with the optical element 107.1 and to impart a predetermined deformation to the optical element 107.1. The optical module 109 is fixed to the support structure 110 in a replaceable manner.SELECTED DRAWING: Figure 2 【課題】結像誤差を素早く補正するために1つ以上の光学素子を特に簡単に能動的に変形することを可能とし、これにより、高い処理量で継続的にできるだけ高い結像品質が得られる光学装置を提供する。【解決手段】光学モジュール109と、光学モジュール109を支持する支持構造部110とを備えるマイクロリソグラフィ用の光学装置108に関する。光学モジュール109は、光学素子107.1および光学素子107.1を保持する保持装置111を備える。保持装置111は、複数の能動的な変形ユニット114.1を有する変形装置114を備え、変形ユニット114.1は光学素子107.1に接触し、光学素子107.1に所定の変形を付与するように構成されている。光学モジュール109は交換可能に支持構造部110に固定されている。【選択図】図2