METHOD AND SYSTEM FOR CONVERGENT POLISHING
PROBLEM TO BE SOLVED: To solve the following problem: full aperture lap polishing still requires highly skilled opticians using artisan techniques; this type of polishing typically requires multiple iterative cycles involving polishing, measuring, and adjusting parameters to converge to the desired...
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| creator | PHILIP E MILLER LANA L WONG JEFFREY D BUDE REBECCA J DYLLA-SPEARS MICHAEL D FEIT PAUL GERAGHTY TAYYAB I SURATWALA DANIEL C MASON RICHARD P DESJARDIN WILLIAM A STEELE |
| description | PROBLEM TO BE SOLVED: To solve the following problem: full aperture lap polishing still requires highly skilled opticians using artisan techniques; this type of polishing typically requires multiple iterative cycles involving polishing, measuring, and adjusting parameters to converge to the desired surface figure (i.e. flatness or conformance to a specified radius).SOLUTION: A polishing system 1000 for polishing an optical element 1012 includes a polishing pad 1010 having a radial dimension and a septum 1014 disposed on the polishing pad 1010. The septum 1014 is configured to partially surround the optical element 1012. The optical element 1012 contacts the polishing pad 1010 over a range of the radial dimension and a pad wear rate of the polishing pad 1010 is substantially constant, as a function of radial dimension, over the range of the radial dimension.SELECTED DRAWING: Figure 10
【課題】フルアパーチャラップ研磨は、今も職人技術を使いこなす熟練した光学技術者が必要である。このタイプの研磨は、通常、研磨、測定、および所望の表面形状に収束させるためのパラメータ（すなわち、平面度または特定の半径への適合性）の調整を含む、複数回の反復サイクルを必要とする。【解決手段】光学素子１０１２を研磨するための研磨システム１０００は、半径方向寸法を有する研磨パッド１０１０と、研磨パッド１０１０上に配置されるセプタム１０１４とを含む。セプタム１０１４は、光学素子１０１２を部分的に包囲するように構成される。光学素子１０１２は、半径方向寸法の範囲にわたって研磨パッド１０１０と接触し、研磨パッド１０１０のパッド摩耗率は、半径方向寸法の範囲にわたって、半径方向寸法の関数としてほぼ一定である。【選択図】図１０ |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2016190318A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2016190318A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2016190318A3</originalsourceid><addsrcrecordid>eNrjZNDydQ3x8HdRcPRzUQiODA5x9VVw8w9ScPb3C3MNcnf1C1EI8PfxDPbw9HPnYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBoZmhpYGxoYWjsZEKQIAn6slKw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND SYSTEM FOR CONVERGENT POLISHING</title><source>esp@cenet</source><creator>PHILIP E MILLER ; LANA L WONG ; JEFFREY D BUDE ; REBECCA J DYLLA-SPEARS ; MICHAEL D FEIT ; PAUL GERAGHTY ; TAYYAB I SURATWALA ; DANIEL C MASON ; RICHARD P DESJARDIN ; WILLIAM A STEELE</creator><creatorcontrib>PHILIP E MILLER ; LANA L WONG ; JEFFREY D BUDE ; REBECCA J DYLLA-SPEARS ; MICHAEL D FEIT ; PAUL GERAGHTY ; TAYYAB I SURATWALA ; DANIEL C MASON ; RICHARD P DESJARDIN ; WILLIAM A STEELE</creatorcontrib><description>PROBLEM TO BE SOLVED: To solve the following problem: full aperture lap polishing still requires highly skilled opticians using artisan techniques; this type of polishing typically requires multiple iterative cycles involving polishing, measuring, and adjusting parameters to converge to the desired surface figure (i.e. flatness or conformance to a specified radius).SOLUTION: A polishing system 1000 for polishing an optical element 1012 includes a polishing pad 1010 having a radial dimension and a septum 1014 disposed on the polishing pad 1010. The septum 1014 is configured to partially surround the optical element 1012. The optical element 1012 contacts the polishing pad 1010 over a range of the radial dimension and a pad wear rate of the polishing pad 1010 is substantially constant, as a function of radial dimension, over the range of the radial dimension.SELECTED DRAWING: Figure 10
【課題】フルアパーチャラップ研磨は、今も職人技術を使いこなす熟練した光学技術者が必要である。このタイプの研磨は、通常、研磨、測定、および所望の表面形状に収束させるためのパラメータ（すなわち、平面度または特定の半径への適合性）の調整を含む、複数回の反復サイクルを必要とする。【解決手段】光学素子１０１２を研磨するための研磨システム１０００は、半径方向寸法を有する研磨パッド１０１０と、研磨パッド１０１０上に配置されるセプタム１０１４とを含む。セプタム１０１４は、光学素子１０１２を部分的に包囲するように構成される。光学素子１０１２は、半径方向寸法の範囲にわたって研磨パッド１０１０と接触し、研磨パッド１０１０のパッド摩耗率は、半径方向寸法の範囲にわたって、半径方向寸法の関数としてほぼ一定である。【選択図】図１０</description><language>eng ; jpn</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161110&DB=EPODOC&CC=JP&NR=2016190318A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161110&DB=EPODOC&CC=JP&NR=2016190318A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PHILIP E MILLER</creatorcontrib><creatorcontrib>LANA L WONG</creatorcontrib><creatorcontrib>JEFFREY D BUDE</creatorcontrib><creatorcontrib>REBECCA J DYLLA-SPEARS</creatorcontrib><creatorcontrib>MICHAEL D FEIT</creatorcontrib><creatorcontrib>PAUL GERAGHTY</creatorcontrib><creatorcontrib>TAYYAB I SURATWALA</creatorcontrib><creatorcontrib>DANIEL C MASON</creatorcontrib><creatorcontrib>RICHARD P DESJARDIN</creatorcontrib><creatorcontrib>WILLIAM A STEELE</creatorcontrib><title>METHOD AND SYSTEM FOR CONVERGENT POLISHING</title><description>PROBLEM TO BE SOLVED: To solve the following problem: full aperture lap polishing still requires highly skilled opticians using artisan techniques; this type of polishing typically requires multiple iterative cycles involving polishing, measuring, and adjusting parameters to converge to the desired surface figure (i.e. flatness or conformance to a specified radius).SOLUTION: A polishing system 1000 for polishing an optical element 1012 includes a polishing pad 1010 having a radial dimension and a septum 1014 disposed on the polishing pad 1010. The septum 1014 is configured to partially surround the optical element 1012. The optical element 1012 contacts the polishing pad 1010 over a range of the radial dimension and a pad wear rate of the polishing pad 1010 is substantially constant, as a function of radial dimension, over the range of the radial dimension.SELECTED DRAWING: Figure 10
【課題】フルアパーチャラップ研磨は、今も職人技術を使いこなす熟練した光学技術者が必要である。このタイプの研磨は、通常、研磨、測定、および所望の表面形状に収束させるためのパラメータ（すなわち、平面度または特定の半径への適合性）の調整を含む、複数回の反復サイクルを必要とする。【解決手段】光学素子１０１２を研磨するための研磨システム１０００は、半径方向寸法を有する研磨パッド１０１０と、研磨パッド１０１０上に配置されるセプタム１０１４とを含む。セプタム１０１４は、光学素子１０１２を部分的に包囲するように構成される。光学素子１０１２は、半径方向寸法の範囲にわたって研磨パッド１０１０と接触し、研磨パッド１０１０のパッド摩耗率は、半径方向寸法の範囲にわたって、半径方向寸法の関数としてほぼ一定である。【選択図】図１０</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDydQ3x8HdRcPRzUQiODA5x9VVw8w9ScPb3C3MNcnf1C1EI8PfxDPbw9HPnYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBoZmhpYGxoYWjsZEKQIAn6slKw</recordid><startdate>20161110</startdate><enddate>20161110</enddate><creator>PHILIP E MILLER</creator><creator>LANA L WONG</creator><creator>JEFFREY D BUDE</creator><creator>REBECCA J DYLLA-SPEARS</creator><creator>MICHAEL D FEIT</creator><creator>PAUL GERAGHTY</creator><creator>TAYYAB I SURATWALA</creator><creator>DANIEL C MASON</creator><creator>RICHARD P DESJARDIN</creator><creator>WILLIAM A STEELE</creator><scope>EVB</scope></search><sort><creationdate>20161110</creationdate><title>METHOD AND SYSTEM FOR CONVERGENT POLISHING</title><author>PHILIP E MILLER ; LANA L WONG ; JEFFREY D BUDE ; REBECCA J DYLLA-SPEARS ; MICHAEL D FEIT ; PAUL GERAGHTY ; TAYYAB I SURATWALA ; DANIEL C MASON ; RICHARD P DESJARDIN ; WILLIAM A STEELE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2016190318A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2016</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>PHILIP E MILLER</creatorcontrib><creatorcontrib>LANA L WONG</creatorcontrib><creatorcontrib>JEFFREY D BUDE</creatorcontrib><creatorcontrib>REBECCA J DYLLA-SPEARS</creatorcontrib><creatorcontrib>MICHAEL D FEIT</creatorcontrib><creatorcontrib>PAUL GERAGHTY</creatorcontrib><creatorcontrib>TAYYAB I SURATWALA</creatorcontrib><creatorcontrib>DANIEL C MASON</creatorcontrib><creatorcontrib>RICHARD P DESJARDIN</creatorcontrib><creatorcontrib>WILLIAM A STEELE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PHILIP E MILLER</au><au>LANA L WONG</au><au>JEFFREY D BUDE</au><au>REBECCA J DYLLA-SPEARS</au><au>MICHAEL D FEIT</au><au>PAUL GERAGHTY</au><au>TAYYAB I SURATWALA</au><au>DANIEL C MASON</au><au>RICHARD P DESJARDIN</au><au>WILLIAM A STEELE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND SYSTEM FOR CONVERGENT POLISHING</title><date>2016-11-10</date><risdate>2016</risdate><abstract>PROBLEM TO BE SOLVED: To solve the following problem: full aperture lap polishing still requires highly skilled opticians using artisan techniques; this type of polishing typically requires multiple iterative cycles involving polishing, measuring, and adjusting parameters to converge to the desired surface figure (i.e. flatness or conformance to a specified radius).SOLUTION: A polishing system 1000 for polishing an optical element 1012 includes a polishing pad 1010 having a radial dimension and a septum 1014 disposed on the polishing pad 1010. The septum 1014 is configured to partially surround the optical element 1012. The optical element 1012 contacts the polishing pad 1010 over a range of the radial dimension and a pad wear rate of the polishing pad 1010 is substantially constant, as a function of radial dimension, over the range of the radial dimension.SELECTED DRAWING: Figure 10
【課題】フルアパーチャラップ研磨は、今も職人技術を使いこなす熟練した光学技術者が必要である。このタイプの研磨は、通常、研磨、測定、および所望の表面形状に収束させるためのパラメータ（すなわち、平面度または特定の半径への適合性）の調整を含む、複数回の反復サイクルを必要とする。【解決手段】光学素子１０１２を研磨するための研磨システム１０００は、半径方向寸法を有する研磨パッド１０１０と、研磨パッド１０１０上に配置されるセプタム１０１４とを含む。セプタム１０１４は、光学素子１０１２を部分的に包囲するように構成される。光学素子１０１２は、半径方向寸法の範囲にわたって研磨パッド１０１０と接触し、研磨パッド１０１０のパッド摩耗率は、半径方向寸法の範囲にわたって、半径方向寸法の関数としてほぼ一定である。【選択図】図１０</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | METHOD AND SYSTEM FOR CONVERGENT POLISHING |
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