IMAGING OPTICAL SYSTEM

PROBLEM TO BE SOLVED: To develop an imaging optical system for a projection exposure system so that imaging quality is further improved.SOLUTION: An imaging optical system (9) for a projection exposure system has at least one anamorphic imaging optical element (M1 to M6). This allows complete illumi...

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Bibliographische Detailangaben
1. Verfasser:	HANS-JUERGEN MANN
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Zusammenfassung:	PROBLEM TO BE SOLVED: To develop an imaging optical system for a projection exposure system so that imaging quality is further improved.SOLUTION: An imaging optical system (9) for a projection exposure system has at least one anamorphic imaging optical element (M1 to M6). This allows complete illumination of an image field in a first direction having a large object-side numerical aperture in the first direction, without the need to increase size of a reticle to be imaged and without occurrence of reduction in throughput of the projection exposure system.SELECTED DRAWING: Figure 2 【課題】結像品質が更に改善されるような投影露光系のための結像光学系を開発すること。【解決手段】投影露光系のための結像光学系（９）は、少なくとも１つのアナモフィック結像光学要素（Ｍ１からＭ６）を有する。これは、結像されるレチクルの大きさを大きくする必要なく、かつ投影露光系のスループットの低下が発生することなく、第１の方向に大きい物体側開口数を有する像視野のこの第１の方向の完全な照明を可能にする。【選択図】図２