METHOD FOR REVISING/REPAIRING LITHOGRAPHIC PROJECTION OBJECTIVE

PROBLEM TO BE SOLVED: To provide a method for revising/repairing a projection objective of a lithography projection exposure apparatus.SOLUTION: A method for revising/repairing a projection objective of a lithography projection exposure apparatus (10), the projection objective comprising a plurality...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PETASCH THOMAS, BORIS BITTNER, JOCHEN HAEUSSLER, OLAF ROGALSKY
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!