METHOD FOR REVISING/REPAIRING LITHOGRAPHIC PROJECTION OBJECTIVE

PROBLEM TO BE SOLVED: To provide a method for revising/repairing a projection objective of a lithography projection exposure apparatus.SOLUTION: A method for revising/repairing a projection objective of a lithography projection exposure apparatus (10), the projection objective comprising a plurality of optical elements between an object plane (12) and an image plane (16), the plurality of optical elements comprising at least one first optical element having a refractive power, comprises the steps of: without exchanging all of the optical elements, removing the at least one first optical element from the projection objective in the field; inserting at least one first spare optical element into the projection objective at the location of the at least one first optical element; and adjusting an image quality of the projection objective to a desired quality.SELECTED DRAWING: Figure 1 【課題】リソグラフィ投影露光装置の投影対物器械を修正／修理する方法を提供する。【解決手段】屈折力を有する少なくとも１つの第１の光学要素を含む複数の光学要素を対物面（１２）と像平面（１６）の間に含むリソグラフィ投影露光装置（１０）の投影対物器械を修正／修理する方法は、光学要素の全てを差し替えることなく、少なくとも１つの第１の光学要素を現場で投影対物器械から取り外す段階、少なくとも１つの第１の予備光学要素を少なくとも１つの第１の光学要素の位置で投影対物器械内に挿入する段階、及び投影対物器械の像品質を望ましい品質へと調節する段階を含む。【選択図】図１