IMPROVED INJECTOR FOR SPATIALLY SEPARATED ATOMIC LAYER DEPOSITION CHAMBER

PROBLEM TO BE SOLVED: To provide apparatus and methods for spatial atomic layer deposition.SOLUTION: The apparatus includes a gas delivery system comprising a first gas flowing through a plurality of legs in fluid communication with valves and a second gas flowing through a plurality of legs into th...

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Bibliographische Detailangaben
Hauptverfasser:	SATO TATSUYA, JEFF TOBIN, PATRICIA M LIU, JOSEPH YUDOVSKY, KEVIN GRIFFIN, ERAN NEWMAN, AARON MILLER
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide apparatus and methods for spatial atomic layer deposition.SOLUTION: The apparatus includes a gas delivery system comprising a first gas flowing through a plurality of legs in fluid communication with valves and a second gas flowing through a plurality of legs into the valves.SELECTED DRAWING: None 【課題】空間的原子層堆積のための装置及び方法を提供する。【解決手段】装置は、バルブと流体連通した複数の脚部を通って流れる第１ガス、及び、複数の脚部を通ってバルブへと流れる第２ガスを備える、ガス供給システムを含む。【選択図】なし