METHOD AND DEVICE FOR PROCESSING MULTILAYER SUBSTRATE WITH LASER BEAM

PROBLEM TO BE SOLVED: To enable processing of a multilayer substrate by a simple configuration without increasing a device cost.SOLUTION: This processing method for processing the multilayer substrate by radiating a laser beam includes a preparing step and a processing step. In the preparing step, t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: NAKATANI FUMIYOSHI, ARAKAWA MIKI
Format: Patent
Sprache:eng ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!