ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM IRRADIATION METHOD

PROBLEM TO BE SOLVED: To provide an electron beam irradiation apparatus, having a function for apparatus calibration, improving a plotting efficiency.SOLUTION: An electron beam irradiation apparatus 11, for performing batch plotting by irradiating an object to be irradiated with an electron beam includes: a first aperture 13, having a first aperture area 13a and a first plotting area 13b; and a second aperture 15, having a second aperture area 15a and a second plotting area 15b. An electron beam 40, passing through the first aperture area 13a, reaches the second plotting area 15b and passes through the first plotting area 13b. The electron beam 40 reaches the second aperture area 15a. At a time of apparatus calibration, the calibration electron beam 40 is generated by the first aperture area 13a and the second aperture area 15a.SELECTED DRAWING: Figure 1 【課題】装置校正用の機能をもち、かつ描画効率を向上させる。【解決手段】被照射対象に電子線を照射させて一括描画を実施する電子線照射装置１１は、第１開口領域１３ａと第１描画領域１３ａを有する第１アパーチャ１３と、第２開口領域１５ａと第２描画領域１５ｂを有する第２アパーチャ１５とを備えている。第１開口領域１３ａを通る電子線４０は第２描画領域１５ｂに達し、第１描画領域１３ｂを通る。電子線４０は第２開口領域１５ａに達する。装置校正時において、第１開口領域１３ａと第２開口領域１５ａとによって校正用電子線４０を生成する。【選択図】図１