POLARIZER, METHOD FOR MANUFACTURING THE SAME, AND ELECTRON BEAM IRRADIATION DEVICE

PROBLEM TO BE SOLVED: To manufacture a polarizer with high accuracy in a short time.SOLUTION: An electron beam 40 is made to pass through a rectangular opening 13a of a first aperture 13 and the electron beam 40 from the first aperture 13 is made to pass through a linear opening 15a of a second aper...

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Bibliographische Detailangaben
Hauptverfasser:	MATSUMOTO TETSUYA, YUSA SATOSHI, MASUDA KENJI, NAGANO JOEKI, OZAWA HIDENORI, YOSHIOKA HIDENORI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To manufacture a polarizer with high accuracy in a short time.SOLUTION: An electron beam 40 is made to pass through a rectangular opening 13a of a first aperture 13 and the electron beam 40 from the first aperture 13 is made to pass through a linear opening 15a of a second aperture 15. A plurality of linear electron beams 40a that has passed through the second aperture 15 is collectively made to irradiate a resist 33 disposed on a laminate 1A to form a pattern in the resist 33. The laminate 1A is etched to obtain a polarizer 10.SELECTED DRAWING: Figure 1 【課題】偏光子を精度良くかつ短時間で製造する。【解決手段】電子線４０を第１アパーチャ１３の矩形状の開口１３ａを通し、第１アパーチャ１３からの電子線４０を第２アパーチャ１５の線状開口１５ａを通す。第２アパーチャ１５を通った複数の線状電子線４０ａを積層体１Ａ上に設けられたレジスト３３に一括して照射してレジスト３３にパターンを形成する。積層体１Ａをエッチングして偏光子１０を得る。【選択図】図１