POLISHING COMPOSITION, POLISHING METHOD AND METHOD FOR PRODUCING CERAMIC PARTS

PROBLEM TO BE SOLVED: To provide a polishing composition that is inexpensive and can bring a high-quality mirror finish to ceramic, to provide a polishing method and to provide a method for producing ceramic parts.SOLUTION: The polishing composition is one for polishing ceramic and contains an abras...

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Bibliographische Detailangaben
Hauptverfasser:	HISHIDA SHOTA, OTSUKI SHINGO, ASAI MAIKO, IKEDO TOMOYA, MORINAGA HITOSHI, ITO YUICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a polishing composition that is inexpensive and can bring a high-quality mirror finish to ceramic, to provide a polishing method and to provide a method for producing ceramic parts.SOLUTION: The polishing composition is one for polishing ceramic and contains an abrasive grain comprising a carbide. The abrasive grain has an average secondary particle size of 0.1 to 10.0 μm and the carbide is at least either one of silicon carbide and boron carbide.SELECTED DRAWING: None 【課題】安価であり且つセラミックに対して高品位な鏡面仕上げを行うことができる研磨用組成物、研磨方法、及びセラミック製部品の製造方法の提供。【解決手段】セラミックを研磨する研磨用組成物であって、炭化物からなる砥粒を含有する研磨用組成物。前記砥粒の平均二次粒子径が０．１〜１０．０μｍであり、前記炭化物として炭化ケイ素又は炭化ホウ素の少なくとも一方である研磨用組成物。【選択図】なし