POLISHING COMPOSITION, POLISHING METHOD AND MANUFACTURING METHOD OF CERAMIC COMPONENT

PROBLEM TO BE SOLVED: To provide a polishing composition which has a low cost and can perform high-quality mirror-surface finishing for ceramic.SOLUTION: A polishing composition contains abrasive grains made of carbide and is used for polishing ceramic. Further, the polishing composition contains th...

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Bibliographische Detailangaben
Hauptverfasser:	HISHIDA SHOTA, OTSUKI SHINGO, ASANO HIROSHI, ASAI MAIKO, IKEDO TOMOYA, TAMAI KAZUMASA, ITO YUICHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a polishing composition which has a low cost and can perform high-quality mirror-surface finishing for ceramic.SOLUTION: A polishing composition contains abrasive grains made of carbide and is used for polishing ceramic. Further, the polishing composition contains the abrasive grains and has pH of 6.0 to 9.0. Further, by using the polishing composition, an object to be polished is polished. Furthermore, as the object to be polished using the polishing composition, a ceramic component is included.SELECTED DRAWING: None 【課題】安価であり且つセラミックに対して高品位な鏡面仕上げを行うことができる研磨用組成物を提供する。【解決手段】研磨用組成物は、炭化物からなる砥粒を含有し、セラミックを研磨するために用いられる。また、本発明の研磨用組成物は、砥粒を含有し、ｐＨが６．０以上９．０以下であることを要旨とする。また、本発明の研磨用組成物を用いて、研磨対象物を研磨することを要旨とする。さらに、本発明の研磨用組成物を用いた研磨対象物に、セラミック製部品を含むことを要旨とする。【選択図】なし