PHOTOSENSITIVE RESIN COMPOSITION
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with high sensitivity which can achieve elastic recovery properties, adhesion to glass substrate, and high resolution.SOLUTION: A photosensitive resin composition comprises hydrophilic resin (A) having a radical-polymerizable organi...
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creator | ISOBE SHINGO TERANISHI MANABU SAKAI MASARU |
description | PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with high sensitivity which can achieve elastic recovery properties, adhesion to glass substrate, and high resolution.SOLUTION: A photosensitive resin composition comprises hydrophilic resin (A) having a radical-polymerizable organic group, polyfunctional (meth) acrylate monomer (B), and benzophenone photopolymerization initiator (C) having am absorption maximum wavelength at least in the range of 300-400 nm as essential components.SELECTED DRAWING: None
【課題】 本発明は、弾性回復特性とガラス基板との密着性、および高解像性を達成できる高感度な感光性樹脂組成物を提供することを目的とする。【解決手段】 ラジカル重合性有機基を有する親水性樹脂(A)、多官能(メタ)アクリレートモノマー(B)、および少なくとも300〜400nmの範囲内に吸収極大波長を有するベンゾフェノン型光重合開始剤(C)を必須成分として含有するすることを特徴とする感光性樹脂組成物を用いる。【選択図】 なし |
format | Patent |
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【課題】 本発明は、弾性回復特性とガラス基板との密着性、および高解像性を達成できる高感度な感光性樹脂組成物を提供することを目的とする。【解決手段】 ラジカル重合性有機基を有する親水性樹脂(A)、多官能(メタ)アクリレートモノマー(B)、および少なくとも300〜400nmの範囲内に吸収極大波長を有するベンゾフェノン型光重合開始剤(C)を必須成分として含有するすることを特徴とする感光性樹脂組成物を用いる。【選択図】 なし</description><language>eng ; jpn</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160609&DB=EPODOC&CC=JP&NR=2016105164A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20160609&DB=EPODOC&CC=JP&NR=2016105164A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ISOBE SHINGO</creatorcontrib><creatorcontrib>TERANISHI MANABU</creatorcontrib><creatorcontrib>SAKAI MASARU</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION</title><description>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with high sensitivity which can achieve elastic recovery properties, adhesion to glass substrate, and high resolution.SOLUTION: A photosensitive resin composition comprises hydrophilic resin (A) having a radical-polymerizable organic group, polyfunctional (meth) acrylate monomer (B), and benzophenone photopolymerization initiator (C) having am absorption maximum wavelength at least in the range of 300-400 nm as essential components.SELECTED DRAWING: None
【課題】 本発明は、弾性回復特性とガラス基板との密着性、および高解像性を達成できる高感度な感光性樹脂組成物を提供することを目的とする。【解決手段】 ラジカル重合性有機基を有する親水性樹脂(A)、多官能(メタ)アクリレートモノマー(B)、および少なくとも300〜400nmの範囲内に吸収極大波長を有するベンゾフェノン型光重合開始剤(C)を必須成分として含有するすることを特徴とする感光性樹脂組成物を用いる。【選択図】 なし</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAI8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PvxMLCmJeYUp_JCaW4GJTfXEGcP3dSC_PjU4oLE5NS81JJ4rwAjA0MzQwNTQzMTR2OiFAEAa64iyA</recordid><startdate>20160609</startdate><enddate>20160609</enddate><creator>ISOBE SHINGO</creator><creator>TERANISHI MANABU</creator><creator>SAKAI MASARU</creator><scope>EVB</scope></search><sort><creationdate>20160609</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION</title><author>ISOBE SHINGO ; TERANISHI MANABU ; SAKAI MASARU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2016105164A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; jpn</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>ISOBE SHINGO</creatorcontrib><creatorcontrib>TERANISHI MANABU</creatorcontrib><creatorcontrib>SAKAI MASARU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ISOBE SHINGO</au><au>TERANISHI MANABU</au><au>SAKAI MASARU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION</title><date>2016-06-09</date><risdate>2016</risdate><abstract>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with high sensitivity which can achieve elastic recovery properties, adhesion to glass substrate, and high resolution.SOLUTION: A photosensitive resin composition comprises hydrophilic resin (A) having a radical-polymerizable organic group, polyfunctional (meth) acrylate monomer (B), and benzophenone photopolymerization initiator (C) having am absorption maximum wavelength at least in the range of 300-400 nm as essential components.SELECTED DRAWING: None
【課題】 本発明は、弾性回復特性とガラス基板との密着性、および高解像性を達成できる高感度な感光性樹脂組成物を提供することを目的とする。【解決手段】 ラジカル重合性有機基を有する親水性樹脂(A)、多官能(メタ)アクリレートモノマー(B)、および少なくとも300〜400nmの範囲内に吸収極大波長を有するベンゾフェノン型光重合開始剤(C)を必須成分として含有するすることを特徴とする感光性樹脂組成物を用いる。【選択図】 なし</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF THEIR PREPARATION OR CHEMICAL WORKING-UP |
title | PHOTOSENSITIVE RESIN COMPOSITION |
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