SUBSTRATE TRANSFER APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus that prevents generation of fine particles.SOLUTION: A substrate transfer apparatus comprises: a tray 100 on which a substrate is loaded; a magnetic transfer unit 200 provided at a lower side of the tray 100, magnetically levitating the...

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Bibliographische Detailangaben
Hauptverfasser: KIM JUNG GUN, LEE KI TAE, SO BYUNG HO, KIM NAM HOON, HAN EUNG YONG, I SANHO, JUNG MIN-HO, KIM SUN GIL, KIM JONG DAE, KO WON IL, SON SEOUNG KYOUNG
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus that prevents generation of fine particles.SOLUTION: A substrate transfer apparatus comprises: a tray 100 on which a substrate is loaded; a magnetic transfer unit 200 provided at a lower side of the tray 100, magnetically levitating the tray 100, and transferring the tray by magnetic force; and a guide unit 300 for guiding the transfer of the tray 100 while not making contact with the tray 100.SELECTED DRAWING: Figure 8 【課題】粉塵の発生を防ぐ基板搬送装置を提供する。【解決手段】基板が載置されるトレイ100と、このトレイ100の下側に設けられ、このトレイ100を磁気浮上させ、磁気力を用いて搬送する磁気搬送ユニット200と、トレイ100と接触されずにトレイ100の搬送をガイドするガイドユニット300とを設ける。【選択図】図8