METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND ION IMPLANTATION DEVICE

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device and an ion implantation device capable of suppressing human errors in ion implantation resumed after interruption.SOLUTION: A method includes a step S16 of measuring a physical quantity that corresponds to a state of a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TOYOFUKU TAKESHI, AKABOSHI FUMIHIKO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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