METHOD FOR IRRADIATING PATTERN OF LIGHT

SOLUTION: To provide a method for irradiating a pattern of light comprising irradiating a pattern of light of ArF excimer laser as a light source using a halftone phase shift mask, in which the halftone phase shift mask comprises a transparent substrate, and a pattern of halftone phase shift film co...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HARAGUCHI TAKASHI, KOITABASHI RYUJI, YOSHIKAWA HIROKI, INAZUKI SADAOMI, KANEKO HIDEO, KOJIMA YOSUKE, HIROSE TOMOKAZU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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