PLASMA PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To suppress the generation of an abnormal discharge in a chamber by suppressing the transmission of an electromagnetic wave.SOLUTION: A plasma processing apparatus that supplies a gas into a chamber, and generates a plasma from the gas by an electric power of an electromagnetic wave, and performs a predetermined plasma processing to a substrate held to a holding base, comprises: a dielectric window that transmits the electromagnetic wave outputted from an electromagnetic wave generator and transfers the electromagnetic wave into the chamber; a supporting member that supports the dielectric window; and a projection part that is adjacent to the dielectric window. Further, the plasma processing apparatus has: a partition member that separates a space to which the support member is arranged and a plasma generating space; and a conductive member that is arranged at the space of the partition member and the dielectric window so as not to expose to the plasma generating space from the projection part.SELECTED DRAWING: Figure 3 【課題】電磁波の伝播を抑制することでチャンバ内における異常放電の発生を抑えることを目的とする。【解決手段】ガスをチャンバ内に供給し、電磁波の電力によりガスからプラズマを生成し、保持台に保持された基板に所定のプラズマ処理を行うプラズマ処理装置であって、電磁波発生器から出力された電磁波を伝播させ、前記チャンバ内に透過させる誘電体窓と、前記誘電体窓を支持する支持部材と、前記誘電体窓に隣接する突出部を有し、前記支持部材が配置された空間とプラズマ生成空間とを仕切る仕切部材と、前記突出部により前記プラズマ生成空間に露出しないように、前記仕切部材と前記誘電体窓との間に配置される導電性部材と、を有するプラズマ処理装置が提供される。【選択図】図３