THIN FILM DEPOSITION APPARATUS, AND THIN FILM DEPOSITION METHOD

PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus and a thin film deposition method that give high adhesion force between a plastic film and a thin film even under severe temperature conditions and high productivity without causing wrinkles and heat defeats, in a vapor-deposited film...

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Bibliographische Detailangaben
Hauptverfasser: SAKAMOTO KEITARO, MUROFUSHI YOSHIRO, AIDA HIROKAZU
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus and a thin film deposition method that give high adhesion force between a plastic film and a thin film even under severe temperature conditions and high productivity without causing wrinkles and heat defeats, in a vapor-deposited film formed by depositing various thin films on the surface of the plastic film.SOLUTION: There are provided a thin film deposition apparatus and a thin film deposition method. The thin film deposition apparatus is equipped with a cooling drum and a thin film deposition mechanism arranged oppositely to the cooling drum in a vacuum vessel. A thin film is formed by the thin film deposition mechanism on the surface of a long-sized film conveyed along the surface of the cooling drum. The thin film deposition apparatus is further equipped with a charged particle irradiation device arranged oppositely to the cooling drum upstream of the thin film deposition mechanism in the direction of conveying the long-sized film.SELECTED DRAWING: Figure 1 【課題】プラスチックフィルムの表面に各種薄膜を形成した蒸着フィルムにおいて、フィルムと薄膜との間の密着力が過酷な温度条件下においても十分高く、かつシワや熱負けなどの欠点を生じることなく、高い生産性での加工が可能な薄膜形成装置、薄膜形成方法を提供する。【解決手段】真空容器内に、冷却ドラムと、前記冷却ドラムに対向して配置された薄膜形成機構を備え、前記冷却ドラムの表面に沿って搬送される長尺フィルムの表面に前記薄膜形成機構により薄膜を形成する薄膜形成装置であって、前記薄膜形成機構に対して前記長尺フィルムの搬送方向の上流側に、前記冷却ドラムに対向して配置された荷電粒子照射装置を備える薄膜形成装置、形成方法。【選択図】 図1