VACUUM EVAPORATION SYSTEM

PROBLEM TO BE SOLVED: To provide a vacuum evaporation system which can control combustible gas concentration in an exhaust system to a predetermined control concentration or less by paying an attention to a combustible gas having a lower limit concentration of ignition, inflammation or explosion, hy...

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Bibliographische Detailangaben
Hauptverfasser:	KANAI TAKASHI, KANEDA NOBUHIRO, HAMAZAKI KOICHI, MIZUTA MITSURU
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a vacuum evaporation system which can control combustible gas concentration in an exhaust system to a predetermined control concentration or less by paying an attention to a combustible gas having a lower limit concentration of ignition, inflammation or explosion, hydrogen in particular in the exhaust system of the vacuum evaporation system.SOLUTION: In a vacuum evaporation system in which an exhaust system having a vacuum pump is connected to a vacuum evaporation apparatus, the vacuum evaporation system is equipped with a combustible gas concentration control means in a vacuum pump installation part of the exhaust system or in a vicinity thereof, the combustible gas concentration control means being able to control combustible gas concentration in the exhaust system to a predetermined control concentration or less by supplying gas for dilution to within the exhaust system.SELECTED DRAWING: Figure 1 【課題】真空蒸着システムの排気系において、とくに特殊ガス成分として着火や引火、ひいては爆発の下限濃度を有する可燃性ガス、特に水素に着目し、排気系内の可燃性ガス濃度を所定の管理濃度以下に制御可能な真空蒸着システムを提供する。【解決手段】真空蒸着機に真空ポンプを有する排気系が接続された真空蒸着システムにおいて、排気系の真空ポンプ設置部またはその近傍に、希釈用気体を排気系内に供給し排気系内の可燃性ガスの濃度を予め定めた管理濃度以下に制御可能な可燃性ガス濃度制御手段を設けたことを特徴とする真空蒸着システム。【選択図】図１