STAGE CONTROL METHOD, MANUFACTURING METHOD OF CORRECTION TEMPLATE, AND TEMPLATE OBSERVATION CORRECTION DEVICE

PROBLEM TO BE SOLVED: To provide a control method for a stage which holds a template capable of observing and correcting a defect part with high accuracy without damaging a mesa part.SOLUTION: The control method for a stage includes: a first stage height confirmation step S1 of calculating a first s...

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Bibliographische Detailangaben
Hauptverfasser: NISHIGUCHI TAKAO, KOSUGE TAKESHI, YOSHIKAWA SHINGO
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a control method for a stage which holds a template capable of observing and correcting a defect part with high accuracy without damaging a mesa part.SOLUTION: The control method for a stage includes: a first stage height confirmation step S1 of calculating a first stage height with which a distance between the defect part within the mesa part and a charged beam irradiation part is a first distance that becomes an observation correctable distance; a plane moving step S3 of moving the stage to a position facing the defect part; a second stage height confirmation step S2 of calculating a second stage height with which a distance between the template and a distance sensor at the position facing the defect part becomes the first distance; a calculation step S5 of calculating a differential between the first stage height and the second stage height; a discrimination step S6 of determining a stage height from a magnitude of the differential; and a control step S7 of moving the stage to a height facing the defect part on the basis of the determination in the discrimination step.SELECTED DRAWING: Figure 1 【課題】メサ部の破損を生じることなく、欠陥部の高精度な観察および修正を行うことができるテンプレートを保持するステージの制御方法を提供する。【解決手段】メサ部内の欠陥部と荷電ビーム照射部の距離が観察修正可能距離となる第1距離である第1ステージ高さを得る第1ステージ高さ確認工程S1と、上記ステージを上記欠陥部対向位置に移動する平面移動工程S3と、上記欠陥部対向位置での上記テンプレートと上記距離センサの距離が上記第1距離となる第2ステージ高さを求める第2ステージ高さ確認工程S2と、上記第1ステージ高さと上記第2ステージ高さの差分を演算する演算工程S5と、上記差分の大きさからステージ高さを決定する判定工程S6と、上記判定工程の決定に基づいて、上記ステージを上記欠陥部対向高さまで移動させる制御工程S7と、を有する。【選択図】図1