GAS SEPARATION MEMBRANE AND PRODUCTION METHOD OF GAS SEPARATION MEMBRANE

PROBLEM TO BE SOLVED: To provide a new gas separation membrane, especially the gas separation membrane capable of efficiently separating hydrogen gas from steam and to provide a production method of the same.SOLUTION: In a gas separation membrane obtained by radiation graft polymerization between a...

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Hauptverfasser: SAWADA SHINICHI, MAEKAWA YASUNARI, ISOBE SHIGETO, HASHIMOTO NAOYUKI, HASEGAWA SHIN
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a new gas separation membrane, especially the gas separation membrane capable of efficiently separating hydrogen gas from steam and to provide a production method of the same.SOLUTION: In a gas separation membrane obtained by radiation graft polymerization between a porous polymeric base material whose main component is a fluorine-based polymer, an olefin polymer or an aromatic polymer and a vinyl monomer, the vinyl monomer includes at least one kind selected from the group consisting of an alkoxysilyl group, a halosilyl group, a carboxyl group, a carboxylate structure, a carboxylic acid ester structure, a sulfo group, a sulfonate structure, a sulfonic acid ester structure, a nitrile group and a glycidyl group. The gas separation membrane including a compound with the carbon number of 3-20 can separate hydrogen gas from steam efficiently.SELECTED DRAWING: Figure 1 【課題】新規な気体分離膜、特に水素ガスと水蒸気を効率的に分離することができる気体分離膜及びその製造方法を提供することを目的とする。【解決手段】フッ素系高分子、オレフィン系高分子、又は芳香族系高分子を主成分とする多孔性高分子基材にビニルモノマーを放射線グラフト重合することによって得られる気体分離膜であって、前記ビニルモノマーが、アルコキシシリル基、ハロシリル基、カルボキシル基、カルボン酸塩構造、カルボン酸エステル構造、スルホ基、スルホン酸塩構造、スルホン酸エステル構造、ニトリル基、及びグリシジル基からなる群より選択される少なくとも1種の構造を含む炭素数3〜20の化合物を含むものである気体分離膜が、水素ガスと水蒸気を効率的に分離することができる。【選択図】図1