SAMPLE HEIGHT DETECTION DEVICE AND PATTERN INSPECTION SYSTEM

PROBLEM TO BE SOLVED: To provide a slit-projection-type sample height detection device in which the detection accuracy hardly decreases even when the diffraction angle of primary diffraction light occurring on a sample surface increases.SOLUTION: When the illumination light having passed through a s...

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Hauptverfasser: OTAKI HISAAKI, OGAWA TSUTOMU
Format: Patent
Sprache:eng ; jpn
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a slit-projection-type sample height detection device in which the detection accuracy hardly decreases even when the diffraction angle of primary diffraction light occurring on a sample surface increases.SOLUTION: When the illumination light having passed through a slit opening part OP1, namely an image of the slit opening part OP1, is reduced and projected on a sample S by an objective lens 17, the planar shape of the slit opening part OP1 is set to a shape defined by one rectangle or a shape defined by overlaying a plurality of rectangles on each other on a plane. The length of the short side of the rectangle is set at Mλ/(2 NA) or shorter. Here, M [times] shows the reduction magnification of the image of the slit opening part OP1 by an illumination optical system 10, NA shows the numerical aperture of the objective lens 17, and λ [nm] shows the wavelength of the illumination light coming into the illumination optical system 10.SELECTED DRAWING: Figure 1 【課題】試料面で生じる1次回折光の回折角が広くなっても検出精度の低下が起こり難いスリット投影型の試料高さ検出装置を提供する。【解決手段】スリット開口部OP1を通過した照明光、つまりスリット開口部OP1の像を対物レンズ17で試料Sに縮小投影するにあたり、スリット開口部OP1の平面形状を1つの長方形によって規定される形状、または複数の長方形を平面上で重ね合わせることによって規定される形状にし、かつ、照明光学系10によるスリット開口部OP1の像の縮小倍率をM[倍]、対物レンズ17の開口数をNA、照明光学系10に入射する照明光の波長をλ[nm]としたときに、上記長方形の短辺の長さをMλ/(2NA)以下にする。【選択図】図1