FILM FORMATION MATERIAL AND FILM FORMATION METHOD

PROBLEM TO BE SOLVED: To provide a film formation material having high heat stability and long-term storage stability, which is a film formation material, especially, which is liquid at room temperature or has a low melting point and rich stability, and which can perform stable supply of a raw mater...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	SASAGAWA KEITA, JO EIKA, MIHASHI SATOSHI, HIRAKI TADAAKI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a film formation material having high heat stability and long-term storage stability, which is a film formation material, especially, which is liquid at room temperature or has a low melting point and rich stability, and which can perform stable supply of a raw material, and can form stably a high-quality film.SOLUTION: A film formation material is shown by a compound represented by LM(OR)[L is a cyclopentadienyl group or a substituted cyclopentadienyl group. M is Ti, Zr or Hf. R is an alkyl group. Each R may be the same or different.].SELECTED DRAWING: Figure 1 【課題】熱安定性、および長期保存安定性の高い成膜材料であって、特に常温で液体又は融点が低く、安定性に富み、原料の安定供給が行え、高品質な膜を安定して形成できる成膜材料の提供。【解決手段】ＬＭ（ＯＲ）３で表される化合物であらわされる成膜材料。［Ｌは、シクロペンタジエニル基または置換シクロペンタジエニル基である。Ｍは、Ｔｉ，Ｚｒ又はＨｆである。Ｒは、アルキル基である。全てのＲは同一でも異なっていても良い。］【選択図】図１