RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM AND METHOD FOR FORMING THE SAME, AND DISPLAY ELEMENT

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a cured film which is excellent in radiation sensitivity, storage stability, chemical resistance, pattern adhesion after development, pattern adhesion after post exposure and transparency; a cured film formed from the radiation-sensitive resin composition; a method for forming the cured film; and a display element provided with the cured film.SOLUTION: A radiation-sensitive resin composition contains a radiation-sensitive acid generating body including at least one of [A] a polymer component including a structural unit having a group represented by formula (1) and a structural unit having a crosslinkable group, in the same or different polymer; and [B] a compound having an oxime sulfonate group and an N-sulfonyloxyimide compound. In the formula (1), R, Rand Reach represents a hydrogen atom, an alkyl group, an alicyclic hydrocarbon group, an aryl group, a group in which a part of or the whole hydrogen atoms in these groups is substituted with a substituent group, or -SiR, Rrepresents an alkyl group having 1 to 10 carbon atoms.SELECTED DRAWING: None 【課題】放射線感度及び保存安定性に優れ、耐薬品性、現像後のパターン密着性、露光引き置き後のパターン密着性、及び透明性に優れる硬化膜を形成できる感放射線性樹脂組成物、感放射線性樹脂組成物から形成される硬化膜、硬化膜の形成方法、並びに硬化膜を備える表示素子の提供。【解決手段】［Ａ］同一又は異なる重合体中に、式（１）で表される基を有する構造単位と架橋性基を有する構造単位とを含む重合体成分、並びに［Ｂ］オキシムスルホネート基を有する化合物及びＮ−スルホニルオキシイミド化合物の少なくとも一つを含む感放射線性酸発生体を含有する感放射線性樹脂組成物。Ｒ１、Ｒ２及びＲ３は、水素原子、アルキル基、脂環式炭化水素基、アリール基、これらの基が有する水素原子の一部又は全部が置換基で置換された基、又は−ＳｉＲＡ３である。ＲＡは、炭素数１から１０のアルキル基である。【選択図】なし