SCAFFOLD MATERIAL FOR CELL GROWTH

PROBLEM TO BE SOLVED: To provide a scaffold material for cell growth capable of exhibiting an excellent cell growth promotion action.SOLUTION: Provided is a scaffold material for cell growth characterized in that the surface of the scaffold material made of polyvinylidene chloride is exposed to a pl...

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Hauptverfasser:	NOGUCHI SHUNEI, HAMAJIMA SOICHIRO, KOBAYASHI SHUICHIRO, ASAKURA MASANORI, HAYASHI TATSUHIDE, KAWAI TATSUSHI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS, ORSURGICAL ARTICLES DISINFECTION, STERILISATION, OR DEODORISATION OF AIR HUMAN NECESSITIES HYGIENE MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS, OR SURGICALARTICLES MEDICAL OR VETERINARY SCIENCE METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS INGENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a scaffold material for cell growth capable of exhibiting an excellent cell growth promotion action.SOLUTION: Provided is a scaffold material for cell growth characterized in that the surface of the scaffold material made of polyvinylidene chloride is exposed to a plasmatized inert gas (e.g., argon gas) atmosphere. The plasma treatment can be performed using a magnetron sputtering device, but, in this case, as a target electrode, preferably, the material free from the generation of sputter particles caused by ion sputtering (e.g., titanium and stainless steel) is used.SELECTED DRAWING: None 【課題】優れた細胞増殖促進作用を奏することができる細胞増殖用足場材料を提供すること。【解決手段】本発明の細胞増殖用の足場材料は、ポリ塩化ビニリデンからなる足場基材の表面が、プラズマ化した不活性ガス（例えばアルゴンガス）雰囲気下に曝されるプラズマ処理が施されていることを特徴とする。プラズマ処理は、マグネトロンスパッタリング装置を用いて行うことができるが、この場合において、ターゲット電極にはイオンスパッタによるスパッタ粒子の発生しない材料（例えばチタンやステンレス）を用いることが好ましい。【選択図】なし