INSTALLATION TABLE, PLASMA PROCESSING DEVICE AND METHOD FOR MANUFACTURING INSTALLATION TABLE

PROBLEM TO BE SOLVED: To provide: an installation table capable of preventing an adhesive from being deteriorated, the adhesive being used for adhesively bonding an electrostatic chuck; and a plasma processing device including the installation table.SOLUTION: An installation table 70 includes an ele...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SUGAMATA TAKESHI, SASAKI YASUHARU, AOTO MASA
Format: Patent
Sprache:eng ; jpn
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide: an installation table capable of preventing an adhesive from being deteriorated, the adhesive being used for adhesively bonding an electrostatic chuck; and a plasma processing device including the installation table.SOLUTION: An installation table 70 includes an electrostatic chuck 50, a base 14 and a tubular sleeve 80. The electrostatic chuck 50 has a front surface exposed to plasma and a rear surface facing the front surface, and includes a first through-hole formed therein. The base 14 is bonded to the rear surface of the electrostatic chuck 50 by a first adhesive 71, and includes a second through-hole formed therein, the second through-hole being communicated with the first through-hole and having a bore diameter larger than that of the first through-hole. The sleeve 80 is bonded to the rear surface of the electrostatic chuck 50 by a second adhesive 72, in a state where the sleeve is communicated with the first through-hole.SELECTED DRAWING: Figure 2 【課題】静電チャックの接着結合に用いられる接着剤の劣化を防止することができる載置台、及びそのような載置台を備えるプラズマ処理装置を提供する。【解決手段】載置台70は、静電チャック50、ベース14、及び筒状のスリーブ80を備える。静電チャック50は、プラズマに曝される表面及び該表面と対向する裏面を有し、第1貫通孔が形成される。ベース14は、静電チャック50の裏面に第1の接着剤71によって接合され、第1貫通孔に連通され前記第1貫通孔の口径よりも大きい口径の第2貫通孔が形成される。スリーブ80は、第2の接着剤72によって、第1貫通孔と連通した状態で静電チャック50の裏面に接合される。【選択図】図2