SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR

PROBLEM TO BE SOLVED: To provide a technique for improving the film quality of a thin film formed on a substrate.SOLUTION: A semiconductor manufacturing apparatus includes: a substrate transfer mechanism which transfers a plurality of substrates arranged in one line along a conveyance path provided...

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Bibliographische Detailangaben
Hauptverfasser:	NUMATA TAKAYUKI, KONNO TAIICHIRO, FUJIKURA HAJIME, NONAKA TAKEHIRO
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONVEYING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HANDLING THIN OR FILAMENTARY MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PACKING PERFORMING OPERATIONS PNEUMATIC TUBE CONVEYORS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a technique for improving the film quality of a thin film formed on a substrate.SOLUTION: A semiconductor manufacturing apparatus includes: a substrate transfer mechanism which transfers a plurality of substrates arranged in one line along a conveyance path provided in a first container so as to reach a carry-out port from a carry-in port, and carries the substrates into/out of a second container one by one; and drive parts for driving the substrate transfer mechanism, the drive parts being formed so as to be capable of separated from the substrate transfer mechanism provided in the first container, and being installed in a substrate carry-in chamber and a substrate carry-out chamber, respectively.SELECTED DRAWING: Figure 1 【課題】基板上に成膜される薄膜の膜質を向上させる技術を提供する。【解決手段】搬入口から搬出口に至るように第１の容器内に設けられた搬送経路に沿って複数の基板を一列に並べて搬送するとともに、第２の容器内外に順番に基板を搬入出する基板搬送機構を駆動させる駆動部は、第１の容器内に設けられる基板搬送機構と分離可能に形成されており、基板搬入室及び基板搬出室内にそれぞれ設置されている。【選択図】図１