PRODUCTION METHOD OF GLASS SUBSTRATE AND GLASS SUBSTRATE

PROBLEM TO BE SOLVED: To provide a production method of a glass substrate which is not affected by a post-processing even when subjected to mirror polishing.SOLUTION: A method of producing a glass substrate 100 uses a glass substrate 100 which has first and second principal surfaces opposing each ot...

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Bibliographische Detailangaben
Hauptverfasser:	OTA SEIGO, NAKAMURA HIROTO, UEKI SHINJI
Format:	Patent
Sprache:	eng ; jpn
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GLASS HOLOGRAPHY INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER JOINING GLASS TO GLASS OR OTHER MATERIALS MATERIALS THEREFOR METALLURGY MINERAL OR SLAG WOOL ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a production method of a glass substrate which is not affected by a post-processing even when subjected to mirror polishing.SOLUTION: A method of producing a glass substrate 100 uses a glass substrate 100 which has first and second principal surfaces opposing each other, with at least one of the principal surfaces being a mirror surface, is characterized by forming a non-penetration hole, a groove or a step 130 on one principal surface by a grinding step and includes 1) a step of forming a protective layer 110 in at least a part of the principal surface consisting of the mirror surface, 2) a step of grinding one principal surface into a specified shape, and 3) a step of removing the protective layer 110. 【課題】鏡面研磨されても後加工の影響を受けないガラス基板の製造方法を提供する。【解決手段】対向する第１の主表面および第２の主表面を有するガラス基板１００であって少なくとも一方の主表面が鏡面であるガラス基板１００を用い、研削工程により一方の主表面に非貫通の穴、溝、又は段差１３０を形成するガラス基板１００の製造方法であって、１）前記ガラス基板１００の、鏡面である主表面の少なくとも一部に保護層１１０を形成する工程、２）一方の主表面を所定形状に研削加工する工程、および３）前記保護層１１０を除去する工程、を有することを特徴とするガラス基板１００の製造方法。【選択図】図３